Infrared halogen lamp tube is heated and cooled by air cooling；
PID temperature control of lamp power can accurately control temperature rise；
Adopt parallel gas path inlet to avoid cold spots during annealing；
Both atmospheric and vacuum treatment methods can be selected, and the gas is purified before intake.；
Product description
Specification parameters
Hardware options
RTP-DTS-12 is a dual-chamber fully automatic annealing system under protective gas. It uses infrared and visible light to heat a single Wafer or sample. It has short process time and high temperature control accuracy. It is suitable for 4-12-inch wafers. Compared with traditional diffusion furnace annealing systems and other RTP systems, its unique chamber design, advanced temperature control technology and unique RL900 software control system ensure excellent thermal uniformity. At the same time, the structural design of the dual chamber and the addition of a wafer robot improve work efficiency.
industry application
Ion implantation annealing
Rapid annealing after ITO coating
oxide
nitride growth
Silicide alloy annealing
GaAs process
Ohmic contact fast alloy
Oxidation reflux
Other semiconductor rapid heat treatment processes
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